发明名称 THIN FILM METAL OXIDE BEARING SEMICONDUCTOR MATERIAL FOR SINGLE JUNCTION SOLAR CELL DEVICES
摘要 <p>A structure for a single junction solar cell. The structure includes a substrate member having a surface region. The structure includes a first electrode structure overlying the surface region of the substrate member. A P absorber layer is formed overlying the first electrode structure. In a specific embodiment, the P absorber layer has a P- type impurity characteristics and a first optical absorption coefficient greater than 104 cm -1 in a wavelength range comprising 400 nm to 800 nm. An N+ layer is provided overlying the P absorber layer and an interface region formed within a vicinity of the P layer and the N+ layer. The structure also includes a high resistivity buffer layer overlying the N+ layer and a second electrode structure overlying the buffer layer.</p>
申请公布号 WO2009042927(A1) 申请公布日期 2009.04.02
申请号 WO2008US77965 申请日期 2008.09.26
申请人 STION CORPORATION;LEE, HOWARD W.H. 发明人 LEE, HOWARD W.H.
分类号 H01L31/109 主分类号 H01L31/109
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