发明名称 METHOD AND APPARATUS FOR WAFER MARKING
摘要 <p>A semiconductor substrate is provided. The substrate includes a first surface and an opposing second surface, wherein the first surface includes a marking in a centroid region of the first surface. The marking indicates a location of a center point on the first surface of the semiconductor substrate or identification data unique to the substrate. A system, methods of transporting and marking, and a device for reading the substrate markings are also provided.</p>
申请公布号 WO2009002888(A3) 申请公布日期 2009.04.02
申请号 WO2008US67810 申请日期 2008.06.21
申请人 ASYST TECHNOLOGIES, INC.;BONORA, ANTHONY, C.;MARTIN, RAYMOND, S.;KROLAK, MICHAEL 发明人 BONORA, ANTHONY, C.;MARTIN, RAYMOND, S.;KROLAK, MICHAEL
分类号 H01L21/68;H01L21/02;H01L21/67 主分类号 H01L21/68
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