| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for generating the electromagnetic wave plasma, which is generated with a small negative bias voltage value and is uniformly propagated into a member to be processed having an internal shape with a high aspect ratio like a pipe; and to provide a generator using such a method. <P>SOLUTION: The electromagnetic wave plasma generator includes a chamber 10 having a gas feed section 40, a gas exhaust section 41 and an electromagnetic wave supply section 22, and a bias-applying means 30 for applying a bias voltage to a member being processed 3, and generates the plasma at a hollow part 5 of the member being processed 3. An electromagnetic wave plasma generator 101 is used where the electromagnetic wave supply section 22 is arranged at a position facing the inside of the chamber 10, while the member to be processed 3 is arranged within the chamber 10, and at least one or more plasma guiding means 1 are provided for guiding a generation area of the plasma generated within the chamber 10 toward the inside of the hollow part 5. <P>COPYRIGHT: (C)2009,JPO&INPIT |
