| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate processing equipment which can realize space-saving of the equipment and can avoid problems caused by the contamination of end surfaces of a substrate (including occurrence of failure, cross contamination to track, exposure devices or the like). <P>SOLUTION: A cleaning portion 93 equipped with an end surface cleaning unit EC which cleans an end surface of substrate is allocated in an indexer block 9. An indexer robot IR installed in an indexer block 9 sends an unprocessed substrate W taken out from a cassette C to the cleaning portion 93 before conveying it to a processing portion, which is a processing block 10 for an anti-reflective coating. In the cleaning portion 93, the end surface and backside of the substrate W are cleaned. Since any substrate W having dirty end surfaces and backside is not carried to the processing portion, any problem arising from the contamination on the end surfaces or backside of substrate can be avoided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
