| 摘要 |
PROBLEM TO BE SOLVED: To detect the size and shape of an irradiation region on an object in a spectroscopic ellipsometer. SOLUTION: In a spectroscopic ellipsometer 1 of a film thickness measuring apparatus 10, reflected light reflected on the measurement surface 91 of a substrate 9 is divided into a first polarized light which is a linearly polarized component in a predetermined polarization direction, and a second polarized light which is a linearly polarized component, in a polarization direction perpendicular to the first polarized light, by an analyzer 42 of a light-receiving part 4. The polarization state at each wavelength of the reflected light is measured with the first polarized light, and the size and shape of the irradiation region on the measurement surface 91 of the substrate 9 are detected by using the second polarized light. In the spectroscopic ellipsometer 1, since the detection of the size and shape of the irradiation region is performed with the second polarized light which is a polarized component that is not used in the measurement of the polarization state, of the reflected light from the measurement surface 91, to detect the size and shape of the irradiation region on the measurement surface 91 of the substrate 9 can be detected with high accuracy, while maintaining the measurement accuracy of the polarization state of the reflected light to be high. COPYRIGHT: (C)2009,JPO&INPIT
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