| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and program that can shorten the time required for determining an exposure condition. <P>SOLUTION: The method of determining, by using a computer, an exposure condition under which an original plate is lit up by a lighting optical system and a substrate is exposed to an image of a pattern of the original plate using a projection optical system includes a process of setting a light intensity distribution on a pupil surface of the lighting optical system based upon a restriction condition associated with an optical element constituting the lighting optical system, a calculation process of calculating the image of the pattern of the original plate projected on the substrate using the exposure condition including the set light intensity distribution, and a determination process of determining an exposure condition for exposing the substrate to the image of the pattern of the original plate based upon the calculation result of the calculation process and the restriction condition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
