| 发明名称 |
METHODS AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE SILICON FILM FOR PHOTOVOLTAIC DEVICE |
| 摘要 |
<p>Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, a photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.</p> |
| 申请公布号 |
EP2041797(A2) |
申请公布日期 |
2009.04.01 |
| 申请号 |
EP20070812222 |
申请日期 |
2007.06.20 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHOI, SOO YOUNG;TAKEHARA, TAKAKO;WHITE, JOHN M.;CHAE, YONG KEE |
| 分类号 |
C23C16/24;C23C16/455;C30B25/10;C30B29/06;H01J37/32;H01L21/205;H01L31/075;H01L31/076;H01L31/18 |
主分类号 |
C23C16/24 |
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