发明名称 A WAFER AND A METHOD FOR MANUFACTURING A WAFER
摘要 <p>A wafer and a method for manufacturing the wafer are provided to improve the electrical characteristic of the passive device by decreasing the number of oxygen induction thermal donors. A wafer(100) comprises a front side(110), a rear side(120), and a high vacancy density region(130). The high public density region is arranged between the front side and the rear side, and has public oxygen composites(160). The public oxygen composite have the VO centers binding the oxygen with the vacancies between lattices.</p>
申请公布号 KR20090033123(A) 申请公布日期 2009.04.01
申请号 KR20080094720 申请日期 2008.09.26
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHULZE HANS JOACHIM;STRACK HELMUT;TIMME HANS JOERG
分类号 H01L21/08 主分类号 H01L21/08
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