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发明名称
利用干涉微影之相位差来提高解析度
摘要
根据本发明之实施例,提出干涉微影(IL)系统和方法。具第一相位差之二同调光束曝照非线性光阻上的第一干涉图案。利用具第二相位差之同样的同调光束曝照非线性光阻上的第二干涉图案。第一与第二相位差相差70度至270度。产生之图案是由第一和第二干涉图案组成。IL可采用第三和第四光束。
申请公布号
TW200915018
申请公布日期
2009.04.01
申请号
TW097130999
申请日期
2008.08.14
申请人
应用材料股份有限公司
发明人
刘国希;亨德尔鲁道夫
分类号
G03F7/20(2006.01);H01L21/027(2006.01)
主分类号
G03F7/20(2006.01)
代理机构
代理人
蔡坤财;李世章
主权项
地址
美国
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