APPARATUS FOR THIN FILM DEPOSITION

摘要

A thin film deposition apparatus is provided to obtain a thin film of high quality by performing thermal-evaporation deposition and sputter deposition together and optimizing evaporation and reaction of each material. A thin film deposition apparatus comprises a process chamber(100) in which a substrate is formed, a sputtering device(140) formed inside of the process chamber, and an evaporator(150). The sputtering device includes a sputter gun(141) formed on the bottom of the process chamber, and a cooling jacket(142) formed on the top of the sputter gun and cooling the sputter gun. The evaporator includes an evaporation crucible(154) in which an evaporation material is contained, and an evaporation crucible lid in which a nozzle for discharging the evaporated material is formed.