| 摘要 |
<p>A substrate processing apparatus is provided to maintain the working state of process blocks good by excluding the influence of the liquid from the substrate. A substrate processing apparatus(500) comprises process blocks(9,10,11,12,13,14) and an interface block(15). The process block or the interface block has drying processing units(SD1, SD2). The drying processing unit has a substrate mounting apparatus, an intermittent rotating apparatus, a liquid layer shaping section, a gas discharging unit, and a controller. The substrate mounting apparatus settles the substrate. The intermittent rotating apparatus rotates the substrate mounting apparatus. The liquid layer shaping section forms the liquid layer on the top of the substrate. The gas discharge unit discharges the gas towards the central part of substrate.</p> |
