发明名称 METHOD OF DETERMINING CONCENTRATION OF ELECTRONS IN PLASMA DEVICES
摘要 FIELD: physics; measurements. ^ SUBSTANCE: present invention pertains to plasma diagnosis and can be used for measuring electron concentration of plasma formations of varying geometry in a wide range of analysed parameters. The method of determining concentration of electrons in plasma devices involves putting a probe in a plasma chamber, generating plasma in the chamber, probing the plasma using low intensity direct current and plotting a volt-ampere characteristic. Concentration of electrons in the plasma can be determined from the volt-ampere characteristic. In the same conditions, plasma is generated and probed using cylindrical probes with different radii, and the volt-ampere characteristic is plotted. The probes have the same length, which is much larger than the radius. An empirical relationship between the values of electron concentration and the radius is drawn. An approximating function is chosen and extrapolated to zero radius. Electron concentration of undisturbed plasma is determined from the value of electron concentration at zero radius. ^ EFFECT: possibility of determining electron concentration of ionised medium at pressure up to atmospheric pressure. ^ 1 dwg
申请公布号 RU2351101(C1) 申请公布日期 2009.03.27
申请号 RU20070133229 申请日期 2007.09.04
申请人 ROSSIJSKAJA FEDERATSIJA V LITSE FEDERAL'NOGO AGENTSTVA PO ATOMNOJ EHNERGII;FEDERAL'NOE GOSUDARSTVENNOE UNITARNOE PREDPRIJATIE "ROSSIJSKIJ FEDERAL'NYJ JADERNYJ TSENTR-VSEROSSIJSKIJ NAUCHNO-ISSLEDOVATEL'SKIJ INSTITUT EHKSPERIMENTAL'NOJ FIZIKI"-FGUP "RFJATS-VNIIEHF" 发明人 BAKUMOV ALEKSEJ OLEGOVICH;IVANOV MAKSIM MIKHAJLOVICH;CHERNYSHOV VLADIMIR ANATOL'EVICH
分类号 H05H1/00 主分类号 H05H1/00
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