| 摘要 |
PROBLEM TO BE SOLVED: To realize high-speed and high-accuracy position detection, while suppressing an increase in the size of a substrate position detecting device. SOLUTION: In the substrate position detecting device of film thickness measuring equipment, an area on a substrate 9 of which the image is picked up by an image pickup element 511 of an image pickup part 51 is turned around by an image pickup part rotating mechanism 52 of a position detecting part 5. Thereby an image of the edge 92 of the substrate 9 is easily picked up at a plurality of image pickup positions in the circumferential direction and the position of the substrate 9 can be detected, without providing a mechanism for rotating a stage that holds the substrate 9. As the result, an increase in the size of the structure of the film thickness measuring equipment relating to position detection of the substrate can be held down, compared with conventional equipment wherein the mechanism for rotating the substrate is provided on a mechanism for moving the substrate in the horizontal direction, and also the high-speed and high-accuracy position detection of the substrate 9 can be realized. COPYRIGHT: (C)2009,JPO&INPIT |
