| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film using SiO as a vapor deposition material, which has excellent gas barrier properties while having high transparency without exhibiting yellow even if a reaction gas is not introduced therein, and to provide a method for producing the same. SOLUTION: In the method for producing the gas barrier film, an SiOx vapor deposition material is used to form an SiOx film on at least one side of a base material film in such an atmosphere that a reaction gas is not introduced, by an electron beam vapor deposition method, wherein the SiOx vapor deposition material has the diffraction pattern of crystalline SiO<SB>2</SB>, and the bulk density to the true density in the SiOx vapor deposition material is 70 to <80%. Also disclosed is a gas barrier film formed by using the same production method, wherein the film thickness of the SiOx film is≤200 nm. COPYRIGHT: (C)2009,JPO&INPIT
|
