| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning apparatus capable of suppressing increase of a cleaning solution for a large sized glass substrate and avoiding decrease of cleaning efficiency by ultrasonic waves. SOLUTION: The ultrasonic cleaning apparatus comprises an ultrasonic nozzle 10 for ultrasonic cleaning, transportation rollers 40 for transporting an object 50 to be cleaned, a cleaning solution supply nozzle 30 for supplying a cleaning solution 60, and a cleaning solution tank 20 for temporarily storing the cleaning solution 60 and the ultrasonic nozzle 10 and the cleaning solution supply nozzle 30 are set above the object 50 to be cleaned which is transported by the transportation rollers 40 and the cleaning solution tank 20 is set under the object 50 to be cleaned. COPYRIGHT: (C)2009,JPO&INPIT
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