发明名称 Evaluation pattern suitable for evaluation of lateral hillock formation
摘要 An evaluation pattern for evaluation of lateral hillock formation is provided with a lattice pattern; and an isolated metallization. The lattice pattern includes: a loop interconnection; and lattice interconnections laterally and vertically arranged to intersect with one another so that a region surrounded by the loop interconnection is divided into a plurality of sub-regions arranged in rows and columns. The width of the lattice interconnections is narrower than the width of the loop interconnection. The isolated metallization is provided in an outmost one of the sub-regions, the outmost one being surrounded by the loop interconnection and corresponding ones of the lattice interconnections.
申请公布号 US2009079459(A1) 申请公布日期 2009.03.26
申请号 US20080232486 申请日期 2008.09.18
申请人 NEC ELECTRONICS CORPORATION 发明人 WATANABE TAKAYUKI
分类号 G01R31/26;H01L23/58 主分类号 G01R31/26
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