发明名称 PROCESS ANALYSIS APPARATUS, PROCESS ANALYSIS METHOD, AND PROCESS ANALYSIS PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technique capable of facilitating modeling of a relation between devices within a production line. <P>SOLUTION: The process analysis apparatus acquires a plurality of signals exchanged between a plurality of manufacturing devices and a control device, and forms a causal structure of the plurality of signals based on correlations between the generation order of the signals (before and after relation) and the signals. More specifically, the causal structure is preferably formed by taking, for each signal, a signal with the highest correlation with the signal concerned of signals preceding in the generation order as a cause of the signal concerned. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009064407(A) 申请公布日期 2009.03.26
申请号 JP20080049807 申请日期 2008.02.29
申请人 OMRON CORP 发明人 ENDO MAKI;INABA HIRONORI;TSURUTA KOSUKE
分类号 G05B19/418;G06Q50/00;G06Q50/04 主分类号 G05B19/418
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