APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR OPENING AND CLOSING PROCESS SPACE INSIDE OF THE SAME

摘要

An apparatus for processing substrate and method for opening and closing process space inside of the same are provided to minimize the occupied area of facility by using simple opening and closing method. The substrate processor comprises the upper chamber(120) and the lower chamber(140). The upper chamber is placed in the process progress on the top of the lower chamber. The upper chamber and lower chamber have the process space. The substrate is placed in the process space on the support plate(150). The shower head supplies the process gas on the top of the support plate. The shower head comprises the upper electrode(132), and the jet tray(134) and vertical axis(136). The bottom of the vertical axis is connected to the upper electrode. The source gas is supplied through the jet tray on the top of the support plate. The plasma is generated by the electric field formed between the upper electrode and support plate. The support unit comprises the supporting shaft(220), the rotating member(240), and the top plate(260) and horizontal move member(280).