发明名称 |
FABRICATION METHOD OF A NANODEVICE STRUCTURE |
摘要 |
<p>A nanodevice structure according to the present invention includes a substrate (10) having alignment marks (16) formed thereon, a plurality of nanomaterial layers (20) applied on the substrate, and electrodes formed to be in partial contact with the upper surface of the nanomaterial layer (20) in order to obtain easy application of the nanomaterial layer (20) and low contact resistance between the electrodes and the nanomaterial layer (20).</p> |
申请公布号 |
EP2038208(A1) |
申请公布日期 |
2009.03.25 |
申请号 |
EP20070747074 |
申请日期 |
2007.06.22 |
申请人 |
KOREA INSTITUTE OF MACHINERY & MATERIALS |
发明人 |
HAN, CHANG-SOO;SONG, JIN-WON;YOON, YEO-HWAN;LEE, EUNG-SUG |
分类号 |
B82B1/00;B81B7/00;B82B3/00;G03F9/00;H01J1/304;H01J31/12;H01L21/00;H01L51/00 |
主分类号 |
B82B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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