TRANSPARENT CONDUCTIVE FILM, PROCESS FOR PRODUCTION OF THE FILM, AND SPUTTERING TARGET FOR USE IN THE PRODUCTION OF THE FILM

摘要

Providing a tin oxide target suitable for the formation of a transparent conductive film by DC sputtering method, DC pulse sputtering method or AC sputtering method. A sputtering target which is used for forming a transparent conductive film by a sputtering method, comprising tin oxide as the main component, and at least one element selected from the A dopant group consisting of zinc, niobium, titanium, magnesium, aluminum and zirconium and at least one element selected from the B dopant group consisting of tungsten, tantalum and molybdenum, as dopants.