发明名称 Ion mill process with sacrificial mask layer to fabricate pole tip for perpendicular recording
摘要 A method of fabrication of the write head of a perpendicular recording head allows for production of P3 pole tips of width less than 200 nm (200x10-9 meters). The method includes fabricating the P2 flux shaping layer, depositing the P3 layer, depositing a layer of ion-milling resistant material, depositing at least one sacrificial layer, shaping the P3 layer into P3 pole tip, removing the at least one sacrificial layer to leave the P3 pole tip, and encapsulating the P3 pole tip.
申请公布号 US7506428(B2) 申请公布日期 2009.03.24
申请号 US20030676728 申请日期 2003.09.30
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 BEDELL DANIEL WAYNE;HARRIS, III TOM KING;KHERA GAUTAM;LE QUANG;PENTEK ARON
分类号 G11B5/187;G11B5/33 主分类号 G11B5/187
代理机构 代理人
主权项
地址