发明名称 SUBSTRATE TREATING APPARATUS
摘要 A substrate treating apparatus is provided to prevent solution permeation inside equipment through a space between a spin head and a cover by forming the spin head having three protrusions and a cover having a joining member to the spin head. A spin head(100) comprises a first or third protrusions(122,124,126) through a plurality of supporting members(110a,110b) supporting the substrate(W). The protrusions have different diameter respectively, and a nozzle body(410) is installed at the center. A supply line supplying a fluid to the rear side of the substrate is molded in the nose body, and the cover is connected to the top end portion of the nozzle body and covers the central part and protrusions. The cover comprises a concavo-convex region which is located in protrusion while being separated by a constant interval. The protrusion blocks the solution flowed into between the spin head and the cover.
申请公布号 KR20090030058(A) 申请公布日期 2009.03.24
申请号 KR20070095368 申请日期 2007.09.19
申请人 SEMES CO., LTD. 发明人 LEE, SEUNG HO
分类号 H01L21/306;H01L21/02 主分类号 H01L21/306
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