发明名称 Ultra-thin die and method of fabricating same
摘要 In accordance with a specific embodiment, a method of processing a semiconductor substrate is disclosed whereby the substrate is thinned, and the dice formed on the substrate are singulated by a common process. Trench regions are formed on a backside of the substrate. An isotropic etch of the backside results in a thinning of the substrate while maintaining the depth of the trenches, thereby facilitating singulation of the die.
申请公布号 US7507638(B2) 申请公布日期 2009.03.24
申请号 US20040881144 申请日期 2004.06.30
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 MANCINI DAVID P.;CHUNG YOUNG SIR;DAUKSHER WILLIAM J.;WESTON DONALD F.;YOUNG STEVEN R.;BAIRD ROBERT W.
分类号 H01L21/30 主分类号 H01L21/30
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