| 摘要 |
<p>An apparatus for nano imprint and a method for forming a semiconductor device using the same are provided to steadily form a micro-pattern by increasing the efficiency and the reliability of the nano imprint lithography process. An apparatus for nano imprint comprises an imprint pattern(120) and a capillary tube(130). The imprint pattern is formed by using the chrome on a transparent substrate(100). The imprint pattern is protruded from the selected side of the transparent substrate. The capillary tube is arranged on the transparent substrate in order to be positioned at the imprint pattern circumference. The capillary tube is arranged under the selected side of the transparent substrate.</p> |
