利用含钛前驱物以原子层沉积制备薄膜之方法,申请号TW097134791-传众专利搜索

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发明名称	利用含钛前驱物以原子层沉积制备薄膜之方法
摘要	本发明系在提供一种利用含钛前驱物以原子层沉积制备薄膜之方法，该方法包含将至少一种前驱物送至基层上，该前驱物具有下列化学式(Ⅰ)之结构：#P 097134791P01.bmpR为1～6个碳原子的烷基；n为0、1、2、3、4或5；L为1～6个碳原子的烷氧基或胺基，该胺基可各自选择性以(C#sB!1#eB!～C#sB!6#eB!)的烷基取代1或2次。
申请公布号	TW200912030	申请公布日期	2009.03.16
申请号	TW097134791	申请日期	2008.09.11
申请人	西格玛奥瑞奇公司	发明人	海斯　彼得　尼可拉斯;金斯里　安德鲁;宋福泉;威廉斯　保罗;利斯　汤玛士;大卫斯　骇威尔　欧文;奥德达　雷杰斯
分类号	C23C16/40(2006.01)	主分类号	C23C16/40(2006.01)
代理机构		代理人	许崑钟
主权项
地址	美国

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