| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for pattern formation forming a pattern which has reduced line edge roughness and further has a high level of dimensional evenness, a resin composition for use in the method and a developing solution for use in the method. <P>SOLUTION: The method for pattern formation includes the step of coating a resist composition, which contains a resin having an alicyclic hydrocarbon structure, having a degree of dispersion of ≤1.7 and causing an enhancement in polarity upon the action of an acid and causes a reduction in solubility in a negative-working developing solution upon exposure to an actinic radiation or a radiation, the step of exposure, and the step of developing the exposed composition with a negative-working developing solution. There are also provided a resist composition for use in the method, and a developing solution and a rinsing liquid for use in the method. <P>COPYRIGHT: (C)2009,JPO&INPIT |
