| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for processing a plurality of substrates in a batch processing chamber. SOLUTION: The process of a plurality of substrates 221 in an inner vessel of a batch processing chamber includes steps of: positioning the plurality of the substrates 221 disposed substantially in parallel whose device side 222 of at least part of the plurality of substrates is directed downwards; and feeding more than one kind of processing gas all over the plurality of the substrates. COPYRIGHT: (C)2009,JPO&INPIT
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