发明名称 VAPORIZER, MATERIAL GAS SUPPLY SYSTEM USING VAPORIZER AND FILM DEPOSITING APPARATUS USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vaporizer having a simple structure and improving thermal efficiency by using a material having high thermal conductivity for one part of a constituent material and bonding the material by explosive welding. SOLUTION: The vaporizer 8 has: a nozzle portion 72 for making a liquid material into mist by using a carrier gas; a vaporizing portion 76 having a plurality of vaporizing paths 74 for vaporizing the material mist to form a material gas; and a discharge head 78 for discharging the material gas to a post-stage. The vaporizing portion consists of: a vaporizing portion main body 108 having a vaporizing path formed therein; a main body accommodating container 110 having both ends formed longer than the vaporizing portion main body; a heater 112 for heating the material mist passing through the vaporizing paths; and connection flange portions 114, 116 provided on both ends of the main body accommodating container. The vaporizing portion main body and the main body accommodating container are each made of a material having thermal conductivity higher than that of the constituent material of the connecting flange portions, and the end of the main body accommodating container is bonded to the coupling flange portions by explosive welding. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009054655(A) 申请公布日期 2009.03.12
申请号 JP20070217640 申请日期 2007.08.23
申请人 TOKYO ELECTRON LTD 发明人 TANAKA KIYOSHI;KOMATSU TOMOHITO;FUTAMURA MUNEHISA
分类号 H01L21/31;B23K20/08;B23K103/20;C23C16/40;C23C16/448 主分类号 H01L21/31
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