发明名称 |
METHOD OF MANUFACTURING MOS TRANSISTOR, AND MOS TRANSISTOR MANUFACTURED BY THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a MOS transistor, and to provide a MOS transistor manufactured by the same. SOLUTION: This method of manufacturing a MOS transistor includes a process for forming a gate pattern 120 on a semiconductor substrate 100 and a process for forming a spacer 134 covering a side wall of the gate pattern. The process for forming the gate pattern includes to provide a gate electrode 112a and a capping film pattern 118 layered in order, and the capping film pattern is formed with a lower capping film pattern 114b and an upper capping film pattern 116a layered in order, and the lower capping film pattern is formed to have a width smaller than that of the upper capping film pattern. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009055027(A) |
申请公布日期 |
2009.03.12 |
申请号 |
JP20080213179 |
申请日期 |
2008.08.21 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
KIM KI-CHUL;SHIN HONG-JAE;LEE JUNG-DEOG |
分类号 |
H01L29/78;H01L21/8238;H01L27/092;H01L29/786 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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