发明名称 FIELD EFFECT TRANSISTOR USING OXIDE FILM FOR CHANNEL AND METHOD OF MANUFACTURING THE SAME
摘要 The present invention provides a field effect transistor including an oxide film as a semiconductor layer, wherein the oxide film includes one of a source part and a drain part to which one of hydrogen and deuterium is added.
申请公布号 US2009065771(A1) 申请公布日期 2009.03.12
申请号 US20070282000 申请日期 2007.08.03
申请人 CANON KABUSHIKI KAISHA 发明人 IWASAKI TATSUYA;KUMOMI HIDEYA
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
代理机构 代理人
主权项
地址