发明名称 |
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR SENSING SUBSTRATE WITH THE APPARATUS |
摘要 |
A substrate processing apparatus and a substrate sensing method are provided to sense all region of a substrate processing surface through an optical signal by rotating the substrate. A support member(120) supports a substrate. A driving unit rotates the supporting member. A light emitting sensor(162) emits an optical signal in order to cross the processed side of the substrate. A light receiving sensor(164) receives the optical signal which the light emitting sensor emits. A control member determines whether the substrate is positioned in a right position of the support member.
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申请公布号 |
KR20090025570(A) |
申请公布日期 |
2009.03.11 |
申请号 |
KR20070090526 |
申请日期 |
2007.09.06 |
申请人 |
SEMES CO., LTD. |
发明人 |
KIM, BOONG;JEONG, YOUNG JU |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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