发明名称 APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR SENSING SUBSTRATE WITH THE APPARATUS
摘要 A substrate processing apparatus and a substrate sensing method are provided to sense all region of a substrate processing surface through an optical signal by rotating the substrate. A support member(120) supports a substrate. A driving unit rotates the supporting member. A light emitting sensor(162) emits an optical signal in order to cross the processed side of the substrate. A light receiving sensor(164) receives the optical signal which the light emitting sensor emits. A control member determines whether the substrate is positioned in a right position of the support member.
申请公布号 KR20090025570(A) 申请公布日期 2009.03.11
申请号 KR20070090526 申请日期 2007.09.06
申请人 SEMES CO., LTD. 发明人 KIM, BOONG;JEONG, YOUNG JU
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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