发明名称 |
Reflective layer buried in silicon and method of fabrication |
摘要 |
A silicon wafer having a distributed Bragg reflector buried within it. The buried reflector provides a high efficiency, readily and accurately manufactured reflector with a body of silicon. A photodetector using the buried layer to form a resonant cavity enhancement of the silicon's basic quantum efficiencies and selectivity is provided. The DBR is created by bonding of two or more substrates together at a silicon oxide interface or an oxide-oxide interface. In the former, an hydrogen implant is used to cleave silicon just above the bond line. In the latter, the bonding is at the oxide layers.
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申请公布号 |
US7501303(B2) |
申请公布日期 |
2009.03.10 |
申请号 |
US20040790403 |
申请日期 |
2004.03.01 |
申请人 |
THE TRUSTEES OF BOSTON UNIVERSITY |
发明人 |
UNLU M. SELIM;EMSLEY MATTHEW K. |
分类号 |
H01L33/00;H01L21/00;H01L21/8242 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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