发明名称 Critical dimension effects correction in raster pattern generator
摘要 A method for generating a charged particle beam flash. The method includes computing an array of dose correction multipliers, based, at least in part, on a resist sensitivity correction factor; and using the array of dose correction multipliers to moduate an exposure dose of the charged particle beam flash.
申请公布号 US7498591(B2) 申请公布日期 2009.03.03
申请号 US20050241792 申请日期 2005.09.30
申请人 APPLIED MATERIALS, INC. 发明人 LOZES RICHARD L.;BULLER BENYAMIN
分类号 G21G5/00;H01J37/302 主分类号 G21G5/00
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