| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus capable of performing a stable power supply operation when supplying high-frequency power to a discharge electrode. SOLUTION: The vacuum treatment apparatus includes the discharge electrode 3, a holding electrode 2, a film forming chamber 6, first and second power supply parts 21a and 21b, and first and second matching parts 13a and 13b. The discharge electrode 3 includes first and second feed points 43 and 44. The holding electrode 2 is disposed facing the discharge electrode 3 and holds a substrate 8. The film forming chamber 6 includes the discharge electrode 3 and the holding electrode 2. The first power supply part 21a supplies first high-frequency power and the second power supply part 21b supplies second high-frequency power whose phase is changed relative to the first high-frequency power. The first matching part 13a outputs the first high-frequency power to the first feed point 43 and matches impedance, and the second matching part 13b outputs the second high-frequency to the second feed point 44 and matches the impedance. The first power supply part 21a and the first matching part 13a, and the second power supply part 21b and the second matching part 13b are respectively integrated and connected to the film forming chamber 6 as one unit. COPYRIGHT: (C)2009,JPO&INPIT
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