Method for determining polarization-optical characteristic of micro lithographic projection exposure system, involves determining transmission factor of projection lens for both orthogonal polarization directions

摘要

#CMT# #/CMT# The method involves determining a transmission factor of a projection lens (24) for both orthogonal polarization directions. The former polarization direction is adjusted before using the polarisator (20) or in a masking plane (18). An intensity measures in an image plane (26) of the projection lens. The latter polarization direction is adjusted before using the polarisator or in the masking plane. Another intensity measures in the image plane of the projection lens. A determined light portion is polarized in the masking plane along the adjusted polarization direction before the polarisator. #CMT#USE : #/CMT# Method for determining a polarization-optical characteristic of a micro lithographic projection exposure system. #CMT#ADVANTAGE : #/CMT# The method involves determining a transmission factor of the projection lens for both orthogonal polarization directions, and thus ensures that the polarization-optical characteristic of the micro lithographic projection exposure system is feasible at small machine expenditure. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic view of a projection exposure system, which is applied for the execution of a method. 10 : Projection exposure system 14 : Light source 18 : Masking plane 20 : Polarisator 24 : Projection lens 26 : Image plane.