发明名称 EXPOSURE HEAD AND IMAGE FORMATION DEVICE USING IT
摘要 <p><P>PROBLEM TO BE SOLVED: To improve a light quantity detecting accuracy by efficiently detecting the light quantity of a light emitting device by installing the light quantity detecting means on any of both the surfaces of a transparent substrate, and introducing the light beams to be totally reflected on the transparent substrate to its light quantity detecting means in an exposure head made by arranging the light emitting units of an organic EL light emitting device, etc. in an array state on the transparent substrate. <P>SOLUTION: In the exposure head in which the light beams from the light emitting units 63 are emitted to an image supporter side through the transparent substrate 62, the transparent substrate 62 is constituted of an approximate plane in which the surface forming the light emitting units 63 and the surface emitting the light beams are approximately parallel with each other. The light quantity detecting means 100 for detecting the light quantity emitted from the light emitting units 63 is stuck on the surface where the light emitting units 63 of the transparent substrate 62 are formed, and the light quantity detecting means 100 are provided at the position where the light beams b to be totally reflected on the transparent substrate 62 are introduced into the light quantity detecting means 100. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009040057(A) 申请公布日期 2009.02.26
申请号 JP20080247638 申请日期 2008.09.26
申请人 SEIKO EPSON CORP 发明人 NOMURA YUJIRO;KITAZAWA ATSUNORI;TSUJINO KIYOSHI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/01;G03G15/04;H04N1/036 主分类号 B41J2/44
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