| 发明名称 |
LITHOGRAPHIC EQUIPMENT AND MANUFACTURING METHOD FOR DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a configuration adjusting a location on the substrate of a beam formed in a pattern generated by an optical engine relative to the substrate. <P>SOLUTION: In the configuration, an array of imaging elements for imaging parts of beams formed in the pattern at points on the substrate is moved relative to the array of elements capable of being separately controlled to beams formed in the pattern by imparting the pattern. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009044165(A) |
申请公布日期 |
2009.02.26 |
| 申请号 |
JP20080233332 |
申请日期 |
2008.09.11 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
GUI CHENG-QUN;BRUINSMA ANASTASIUS JACOBUS ANICETUS;DE JAGER PIETER WILLEM HERMAN;VENEMA WILLEM JURRIANUS |
| 分类号 |
H01L21/027;G02B3/00;G03F7/20;G03F9/02 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
