发明名称 METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To suppress continuity failure in pixel electrode and to rework an organic insulating film. SOLUTION: The method for manufacturing an active matrix substrate 20 comprises: forming an organic insulating film having contact holes H for connecting the respective TFTs 5 as superposing a plurality of TFTs 5 formed on a substrate; inspecting the organic insulating film thus formed; reworking the organic insulating film on each TFT5 when the inspected organic insulating film shows abnormality; and forming a plurality of pixel electrodes 17 in a matrix state on the organic insulating film when the inspected organic insulating film is normal. The reworking process includes a stripping process, ashing process, first cleaning process of cleaning the substrate with a first cleaning liquid containing monoethanolamine, second cleaning process with a second cleaning liquid containing dimethylsulfoxide, and third cleaning process of cleaning with pure water. After the third cleaning process, the organic insulating film is reworked. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009042593(A) 申请公布日期 2009.02.26
申请号 JP20070208893 申请日期 2007.08.10
申请人 SHARP CORP 发明人 NAKAZAWA AKINORI
分类号 G02F1/1333;G02F1/13 主分类号 G02F1/1333
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