发明名称 |
Substrate treatment apparatus and substrate treatment method |
摘要 |
A substrate treatment apparatus for removing an unnecessary substance from a surface of a substrate. The apparatus is provided with: an oxidation liquid supply mechanism for supplying an oxidation liquid having an oxidative effect to the substrate surface; a physical cleaning mechanism for physically cleaning the substrate surface; and an etching liquid supply mechanism for supplying an etching liquid having an etching effect to the substrate surface. It is preferred to physically clean the substrate surface while supplying the oxidation liquid to the substrate surface.
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申请公布号 |
US7494549(B2) |
申请公布日期 |
2009.02.24 |
申请号 |
US20030631797 |
申请日期 |
2003.07.31 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
EITOKU ATSURO |
分类号 |
B05B17/06;B08B3/00;B08B3/02;B08B3/04;B08B3/08;B08B3/12;B08B7/00;B08B7/04;C23F1/18;H01L21/00;H01L21/304;H01L21/306 |
主分类号 |
B05B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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