Panel facet's optical surface producing method for microlithography projector, involves adjusting tilting angle at longitudinal axis or tilting angle at transverse axis at facet base bodies in predetermined range

摘要

The method involves distinguishing optical surface (3) by tilting of a surface normal around a tilting angle at a longitudinal axis and a tilting angle at a transverse axis of panel facets (2) using a rotational active surface of a tool. The tilting angle at the longitudinal axis or the tilting angle at the transverse axis is adjusted at facet base bodies in a predetermined range, where the adjustment of the tilting angle at the longitudinal axis is carried out free from an active adjustment of the tilting angle at the transverse axis. Independent claims are also included for the following: (1) a processing device i.e. polishing device (2) a faceted optical component i.e. reflection mirror (3) a method for assembling a faceted component (4) an illuminating system for extreme UV lithography (5) a lithography projector with an illuminating system.