SILICON ELECTRODE PLATE PROVIDING UNIFORM ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a silicon electrode plate achieving uniform plasma etching even when the etching is carried out for a long time. SOLUTION: The silicon electrode plate is constituted by boring gas jet holes 5 in a silicon electrode plate 2, and each of the gas jet holes 5 has a bottomed large-diameter hole portion 8 whose depth is less than the thickness of the silicon electrode plate 2 and which has an axis along the thickness of the silicon electrode plate and a plurality of through thin holes 9 penetrating the silicon electrode plate along the thickness of the silicon electrode plate 2 in nonparallel directions from a bottom portion of the bottomed large-diameter hole portion 8 to one surface of the silicon electrode plate 2. COPYRIGHT: (C)2009,JPO&INPIT