发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device capable of quick and efficiently conducting a bump shape-processing and an inspection treatment about an electrical characteristic of a wiring pattern, of efficiently decreasing a facility cost, a foorptint, or the like, and of reducing a time-consuming work of an operator. SOLUTION: A substrate processing device (1) for processing the substrate with a solde bump imparted comprises: a bump shaping part (12) for shaping the solder bump imparted to the substrate; an electrical characteristic inspecting part (11) provided at an upstream side or a downstream side of the bump shaping part (12) in a path for conveying the substrate, for conducting a probe to the solder bump, and for inspecting the electrical characteristic of the wiring pattern provided on the substrate including the solder bump; and a substrate conveying mechanism (15) for conveying the substrate along the path for conveying. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009038146(A) 申请公布日期 2009.02.19
申请号 JP20070199752 申请日期 2007.07.31
申请人 NIDEC-READ CORP 发明人 MIKI TAKASHI
分类号 H01L21/60;G01R31/02;H01L23/12;H05K3/34 主分类号 H01L21/60
代理机构 代理人
主权项
地址