| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress a phenomenon in which generated substance stuck to a structure provided in the vicinity of a target within a vacuum chamber is peeled and forms fine dust. <P>SOLUTION: A film deposition apparatus has a cylindrical drum which is disposed in the vacuum chamber, holds a base material to be treated at the circumferential face thereof and is constituted rotatably, and has a constitution such that a strip-shaped target can be arranged at a position opposite to the circumferential face of the cylindrical drum in such a manner that the axial direction of the cylindrical drum matches with the axial direction of the target, wherein at a position in which the target and the base material are made closest, the apparatus is provided, between the target and the base material, with a nonstructure space having a semicylindrical shape having the center line in the longitudinal direction of the target as the center axis and having a radius of 1.5T, wherein T represents the length in the shortage direction of the target. <P>COPYRIGHT: (C)2009,JPO&INPIT |
