METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT, A SEMICONDUCTOR COMPONENT, AND AN INTERMEDIATE PRODUCT IN THE PRODUCTION THEREOF

摘要

The invention relates to a method for producing semiconductor elements having a contact structure with a high aspect ratio, comprising the following steps: preparing a substantially flat semiconductor substrate (2) having a first side (3) and a second side (4), applying a mask (6) to at least one first partial area (7) on at least one of the sides (3, 4) of the semiconductor substrate (2), and applying a contact structure (8) to an at least second partial area (9) different from the first partial area (7) on at least one of the sides (3, 4) of the semiconductor substrate (2).