发明名称 Method for fabricating of an array substrate for LCD
摘要 An array substrate having double-layered metal patterns for use in a liquid crystal display device and a manufacturing method thereof are disclosed in the present invention. The array substrate includes a gate electrode and a gate line each having a molybdenum alloy (Mo-alloy) layer and a copper (Cu) layer configured sequentially on a substrate; a gate insulation layer on the substrate to cover the gate electrode and the gate line; an active layer arranged on the gate insulation layer in a portion over the gate electrode; an ohmic contact layer on the active layer; a data line on the gate insulation layer, the data line crossing the gate line and defining a pixel region; source and drain electrodes on the ohmic contact layer, the source electrode extending from the data line, and the drain electrode spaced apart from the source electrode; a passivation layer on the gate insulation layer covering the data line and the source and drain electrode, the passivation layer having a drain contact hole exposing a portion of the drain electrode; and a pixel electrode configured on the passivation layer in the pixel region, the pixel electrode electrically contacting the drain electrode through the drain contact hole.
申请公布号 KR100883769(B1) 申请公布日期 2009.02.18
申请号 KR20020069285 申请日期 2002.11.08
申请人 发明人
分类号 G02F1/136;G02F1/1343;G02F1/1345;G02F1/1362;G02F1/1368;H01L21/28;H01L21/3205;H01L21/77;H01L21/84;H01L23/52;H01L27/12;H01L29/423;H01L29/49;H01L29/786;(IPC1-7):G02F1/136 主分类号 G02F1/136
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