发明名称 |
Thin-film magnetic head structure, method of manufacturing the same, and thin-film magnetic head |
摘要 |
A method of manufacturing a thin-film magnetic head structure comprises the steps of preparing an insulating layer 10; forming a first resist layer 51 provided with a first slit pattern 51a corresponding to a very narrow groove part and a second slit pattern 51b corresponding to a temporary groove part integrally extending from the very narrow groove part along outer edges of a main depression onto the insulating layer 10; etching the insulating layer 10 while using the first resist layer 51 as a mask; eliminating the first resist layer 51; forming a second resist layer having an opening pattern corresponding to the main depression onto the insulating layer 10; and etching the insulating layer 10 while using the second resist layer as a mask.
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申请公布号 |
US7492555(B2) |
申请公布日期 |
2009.02.17 |
申请号 |
US20050179728 |
申请日期 |
2005.07.13 |
申请人 |
HEADWAY TECHNOLOGIES, INC.;SAE MAGNETICS (H.K.) LTD. |
发明人 |
SASAKI YOSHITAKA;ITO HIROYUKI;KAMIGAMA TAKEHIRO;SHIMIZU TATSUSHI;ARAKI HIRONORI;TANEMURA SHIGEKI;ISHIZAKI KAZUO |
分类号 |
G11B5/127 |
主分类号 |
G11B5/127 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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