POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN

摘要

Disclosed is a positive resist composition comprising a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) which can generate an acid upon being exposed to light, wherein the resin component (A) comprises a constitutional unit (a1) derived from hydroxystyrene, a constitutional unit (a2) represented by the general formula (a2-1) or (a2-2) and a constitutional unit (a3) represented by the general formula (a3-1) or (a3-2). [Chemical formulae](a2-1) (a2-2) (a3-1) (a3-2)