发明名称 APPARATUS FOR DETECTING POSITION OF SUBSTRATE AND METHOD FOR CALIBRATING POSITION OF IMAGING PARTS THEREOF
摘要 A substrate position detecting apparatus is arranged in the vicinity of a turnable placing table whereupon the substrate is to be placed, and a substrate receiving/transferring apparatus, which is prepared separately from the placing table and permits a supporting pin to be driven in the horizontal direction to the placing table. A method for arranging coordinates of an imaging region of an imaging component on a substrate imaging surface is disclosed. In the method, a wafer with a mark which corresponds to the circumference of the substrate is supported at a prescribed height above the placing table by a supporting pin, the mark is brought into an imaging region, and the mark is detected at a plurality of points by shifting the mark in one direction by a prescribed distance within an imaging region, by driving the supporting pin in the horizontal direction. The coordinate axis direction is corrected in accordance with arrangement direction of the detected points, the wafer with the mark is maintained at a prescribed height above the placing table by the height adjusting jig, the mark is permitted to be in the imaging region, and the mark is detected at a plurality of points by turning the placing table to shift the mark in the imaging region by a prescribed angle, and the original point position of the coordinates are corrected in accordance with a rotation center obtained based on the plurality of points.
申请公布号 KR20090016444(A) 申请公布日期 2009.02.13
申请号 KR20087019753 申请日期 2008.02.12
申请人 TOKYO ELECTRON LIMITED 发明人 SHINDO TAKEHIRO
分类号 H01L21/68;H01L27/146 主分类号 H01L21/68
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