发明名称 Photosensitive resin composition and cured article thereof
摘要 A photosensitive resin composition which is excellent in photosensitivity and excellent in flame resistance, flexibility, adhesiveness, pencil hardness, resistance to solvent, acid resistance, heat resistance, resistance to gold plating and the like and a cured article thereof are provided. An alkaline aqueous solution-soluble photosensitive resin composition containing an alkaline aqueous solution-soluble resin (A) obtained by adding a polybasic acid anhydride (c) to a resin (C) which is a reaction product of an epoxy resin (a) represented by the formula (1) with an unsaturated monocarboxylic acid (b), an epoxy resin (a') represented by the formula (1) as a curing agent (B) and a photopolymerization initiator. [In the formula, n represents a positive number of 1 to 10 as an average value.]
申请公布号 US2009042126(A1) 申请公布日期 2009.02.12
申请号 US20060988903 申请日期 2006.07.20
申请人 TANAKA RYUTARO;KURIHASHI TORU;KOYANAGI HIROO 发明人 TANAKA RYUTARO;KURIHASHI TORU;KOYANAGI HIROO
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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