发明名称 FINFET MEMORY CELL HAVING A FLOATING GATE AND METHOD THEREFOR
摘要 A fin field effect transistor (FinFET) memory cell and method of formation has a substrate for providing mechanical support. A first dielectric layer overlies the substrate. A fin structure overlies the dielectric layer and has a first current electrode and a second current electrode separated by a channel. A floating gate has a vertical portion that is adjacent to and electrically insulated from a side of the channel and has a horizontal portion overlying the first dielectric layer and extending laterally away from the channel. The floating gate stores electrical charge. A second dielectric layer is adjacent the floating gate. A control gate adjacent the second dielectric layer and physically separated from the floating gate by the second dielectric layer. The "L-shape" of the floating gate enhances capacitive coupling ratio between the control gate and the floating gate.
申请公布号 US2009039420(A1) 申请公布日期 2009.02.12
申请号 US20070835548 申请日期 2007.08.08
申请人 TRIVEDI VISHAL P;MATHEW LEO 发明人 TRIVEDI VISHAL P.;MATHEW LEO
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
代理机构 代理人
主权项
地址